Electronic Theses and Dissertations
Identifier
4806
Date
2016
Document Type
Thesis
Degree Name
Master of Science
Major
Mechanical Engineering
Committee Chair
Ebrahim Asadi
Committee Member
Gladius Lewis
Committee Member
Steven F Wayne
Abstract
A review of current deposition processes is presented as they relate to osseointegration of metallic bone implants. The objective is to present a comprehensive review of different deposition processes used to apply microstructured and nanostructured osteoconductive coatings on metallic bone implants. Implant surface topography required for optimal osseointegration is presented. Five of the most widely used osteoconductive coating deposition processes are reviewed in terms of their microstructure and nanostructure, usable thickness and cost, all of which are summarized in tables and charts. Plasma spray techniques offer cost-effective coatings, but exhibits deficiencies with regard to osseointegration such as, high density, amorphous coatings. Electrodeposition and aerosol deposition techniques facilitate the development of a controlled-microstructure coating at a similar cost. Nano scale physical vapor deposition and chemical vapor deposition offers an alternative approach by allowing the coating of a highly structured surface without significantly affecting the microstructure. Various biomedical studies on each deposition process are reviewed along with applicable results. Suggested directions for future research include further optimization of the process-microstructure relation, crystalline plasma spray coatings and the deposition of discrete coatings by additive manufacturing.
Library Comment
Dissertation or thesis originally submitted to the local University of Memphis Electronic Theses & dissertation (ETD) Repository.
Recommended Citation
Moore, Bailey Jordan, "Deposition Methods for Microstructured and Nanostructured Coatings on Metallic Bone Implants: A Review" (2016). Electronic Theses and Dissertations. 1530.
https://digitalcommons.memphis.edu/etd/1530
Comments
Data is provided by the student.