Enhanced extended depth-of-field microscopy via modeling of SLM effects on the applied phase mask
Abstract
To represent the imaging model precisely for wavefront encoded systems, we modified our forward model to take into consideration the diffraction inefficiency of spatial light modulator response and its effect on the ideal phase mask. © 2014 OSA.
Publication Title
Optics InfoBase Conference Papers
Recommended Citation
Hossain, S., King, S., & Preza, C. (2014). Enhanced extended depth-of-field microscopy via modeling of SLM effects on the applied phase mask. Optics InfoBase Conference Papers https://doi.org/10.1364/isa.2014.iw4c.4
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