"The thickness of thin surface films determined by photo-electron spect" by G. Lewis and P. G. Fox
 

The thickness of thin surface films determined by photo-electron spectroscopy

Abstract

The thickness of inhibitive films formed on copper surfaces immersed in solutions of benztriazole (BTA) have been estimated by three methods based on X-ray photo-electron spectroscopy and compared with the results from a fourth method using the electrical capacitance of such films. All but one of the methods show that the film thickness increases with time of immersion and range in thickness between 1 and 3 nm for immersion times of minutes to several hours. The limitation and accuracy of each method are discussed. © 1978.

Publication Title

Corrosion Science

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