An enhanced model for thin film resistor matching
Abstract
This paper presents an improved model which estimates the geometry required to achieve a desired matching target for rectangular resistors in a semiconductor process. A methodology is explained for estimating the model parameters involved. Measured data is presented which covers an extensive range of geometries on a particular thin film process, andthe estimation methodology is followed to derive appropriate model parameters. Using thisnew model, insights into the underlying error sources for the process are obtained.
Publication Title
IEEE International Conference on Microelectronic Test Structures
Recommended Citation
O'Dwyer, T., & Kennedy, M. (2009). An enhanced model for thin film resistor matching. IEEE International Conference on Microelectronic Test Structures, 45-49. https://doi.org/10.1109/ICMTS.2009.4814608
